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Jang-Hyeon Seok
Institution:
Hansol Chemical (South Korea)
Observed institution:
Hansol Chemical (South Korea)
ORCID:
0009-0007-0174-5177
Observed ORCID:
0009-0007-0174-5177
OpenAlex ID:
A5112747123
Atomic layer deposition of titanium oxide thin films using a titanium precursor with a linked amido-cyclopentadienyl ligand
2022
·
Seongyoon Kim
, Romel Hidayat
, et al.
·
Journal of Materials Chemistry C
·
19
Surface reaction mechanism of atomic layer deposition of niobium oxide: In situ characterization and first-principle study
2023
·
Khabib Khumaini
, Hyeonsu Roh
, et al.
·
Applied Surface Science
·
10
Surface Modification Effects on Electrochemical Synthesis of NaBH4 for Hydrogen Storage
2026
·
Yongmin Park
, Youngwon Kim
, et al.
·
Korean Journal of Chemical Engineering
Ligand Effects in Niobium Precursors for Atomic Layer Deposition of Niobium Oxide Films
2025
·
Cha-Hee Kim
, Khabib Khumaini
, et al.
·
ECS Journal of Solid State Science and Technology
Thermal Atomic Layer Deposition of Silicon Carbonitride: A Density Functional Theory Study
2023
·
Tanzia Chowdhury
, Ye Rim Choi
, et al.
·
ECS Meeting Abstracts
Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Thin Film at 100oc Using Novel Silicon Precursors
2016
·
Se-Jin Jang
, Joong-Jin Park
, et al.
·
ECS Meeting Abstracts
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Works count:
6
Citation count:
29
H-index:
2
I10-index:
2
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