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Shih-En Tseng

Observed names: Shih En Tseng, Shih-en Tseng
Observed institution: ASML (United States)
OpenAlex ID: A5112857364
Process capability comparison between LELE DPT and spacer for NAND flash 32nm and below
2008 · Shih-en Tseng, Alek C. Chen · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
The improvement of DOF for sub-100nm process by focus scan
2006 · Jung-Chan Kim, Hyun-Jo Yang, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Impact of EUV patterning scenario on different design styles and their ground rules for 7nm/5nm node BEOL layers
2016 · Tsann-Bim Chiou, Alek C. Chen, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Extreme Ultraviolet Process Optimization for Contact Layer of 14 nm Node Logic and 16 nm Half Pitch Memory Devices
2012 · Shih-En Tseng, Alek Chen · Japanese Journal of Applied Physics · 3
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The contact hole solutions for future logic technology nodes
2007 · Alek Chen, Steve Hansen, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
High NA polarized light lithography for 0.29k1 process
2006 · Chanha Park, Jeonkyu Lee, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
EUV mask manufacturing readiness in the merchant mask industry
2017 · Michael Green, Yohan Choi, et al. · International Conference on Extreme Ultraviolet Lithography · 2
Immersion scanner proximity matching using angle resolving scatterometry metrology
2009 · Ren-Jay Kou, Reiner Jungblut, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Litho scenario solutions for FinFET SRAM 22nm node
2009 · Shih-En Tseng, Shun-Der Wu, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
The random contact hole solutions for future technology nodes
2007 · Alek Chen, Steve Hansen, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
The Magnitude of Potential Exposure-Tool-Induced Critical Dimension and Overlay Errors in Double Dipole Lithography for the 65-nm and 45-nm Technology Nodes
2004 · Tsann-Bim Chiou, Alek C. Chen, et al. · Japanese Journal of Applied Physics · 1
The magnitude of potential exposure tool induced CD and OL errors in the double exposure dipole (DDL) for 65 nm and 45 nm technology nodes
2004 · Tsann-Bim Chiou, Shih-En Tseng, et al. · International Microprocesses and Nanotechnology Conference (MNC) · 1
MRC optimization for EUV high NA imaging for the 32-nm HP technology node
2011 · Shih-En Tseng, Alek Chen · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
How to obtain accurate resist simulations in very low-k1 era?
2006 · Tsann-Bim Chiou, Chan-Ha Park, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Modele des solides deformables pour la simulation et le controle en temps reel de robot
1999 · Shih-En Tseng
Works count: 15
Citation count: 28
H-index: 3
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