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H.Y. Li
Observed names:
H. Y. Li,
Haiwen Li,
Haoyun Li,
Hengkuan Li,
Hongyu Y. Li,
Li, Haifang
show all 6
Institutions:
Tiangong University,
Guangxi Normal University,
Jiangsu University of Science and Technology,
Xi'an University of Technology
Observed institutions:
Agency for Science, Technology and Research,
Tiangong University,
Singapore Science Park,
Guangxi Normal University,
Institute of Microelectronics,
Jiangsu University of Science and Technology,
Xi'an University of Technology
show all 7
ORCID:
0000-0001-8456-5129
Observed ORCID:
0000-0001-8456-5129
OpenAlex ID:
A5113379331
Development of through silicon via (TSV) interposer technology for large die (21×21mm) fine-pitch Cu/low-k FCBGA package
2009
·
Xiaowu Zhang
, T.C. Chai
, et al.
·
2022 IEEE 72nd Electronic Components and Technology Conference (ECTC)
·
112
Development of Wafer-Level Warpage and Stress Modeling Methodology and Its Application in Process Optimization for TSV Wafers
2012
·
Faxing Che
, Hongyu Y. Li
, et al.
·
IEEE Transactions on Components Packaging and Manufacturing Technology
·
79
Modelling and characterization on wafer to wafer hybrid bonding technology for 3D IC packaging
2019
·
L. Ji
, F.X. Che
, et al.
·
IEEE Electronics Packaging Technology Conference (EPTC)
·
44
A small OCA on a 1/spl times/0.5-mm/sup 2/ 2.45-GHz RFID Tag-design and integration based on a CMOS-compatible manufacturing technology
2006
·
L.H. Guo
, A.P. Popov
, et al.
·
IEEE Electron Device Letters
·
24
Bendability of single-crystal Si MOSFETs investigated on flexible substrate
2006
·
H.Y. Li
, L.H. Guo
, et al.
·
IEEE Electron Device Letters
·
23
Novel Monolithic Integration of RF-MEMS Switch with CMOS-IC on Organic Substrate for Compact RF System
2006
·
Q. X. Zhang
, A.B. Yu
, et al.
·
Technical digest - International Electron Devices Meeting/Technical digest
·
17
A study of post-etch wet clean on electrical and reliability performance of Cu/low k interconnections
2004
·
C.F. Tsang
, C.K. Chang
, et al.
·
Microelectronics Reliability
·
14
Impact of packaging design on reliability of large die Cu/low-κ (BD) interconnect
2008
·
T.C. Chai
, Xiaowu Zhang
, et al.
·
2022 IEEE 72nd Electronic Components and Technology Conference (ECTC)
·
13
Successful transferring of active transistors, rf-passive components and high density interconnect from bulk si to organic substrates
2006
·
L.H. Guo
, Q.X. Zhang
, et al.
·
13
Strategy for TSV scaling with consideration on thermo-mechanical stress and acceptable delay
2012
·
K. Ghosh
, J. Zhang
, et al.
·
International Microsystems, Packaging, Assembly and Circuits Technology Conference
·
12
High-Q on-chip inductors using extremely thick silicon dioxide and copper-damascene technology
2008
·
M. Tang
, H.Y. Li
, et al.
·
Electronics Letters
·
10
Effect of Prebonding Anneal on the Microstructure Evolution and Cu–Cu Diffusion Bonding Quality for Three-Dimensional Integration
2012
·
L. Peng
, D.F. Lim
, et al.
·
Journal of Electronic Materials
·
9
Integration of RF MEMS and CMOS IC on a Printed Circuit Board for a Compact RF System Application Based on Wafer Transfer
2008
·
Q.X. Zhang
, A.B. Yu
, et al.
·
IEEE Transactions on Electron Devices
·
8
High performance embedded RF passive device process integration
2008
·
H. Y. Li
, Y. M. Khoo
, et al.
·
2022 IEEE 72nd Electronic Components and Technology Conference (ECTC)
·
6
Effects of plasma treatments on structural and electrical properties of methyl-doped silicon oxide low dielectric constant film
2005
·
W.Y. Leong
, C.F. Tsang
, et al.
·
Thin Solid Films
·
6
Enhancing the efficiency of postetch polymer removal using megasonic wet clean for 0.13-μm dual damascene interconnect process
2004
·
C.K. Chang
, T.H. Foo
, et al.
·
Thin Solid Films
·
6
Design, fabrication and electrical characterization of TSV
2010
·
L. Zhang
, H.Y. Li
, et al.
·
IEEE Electronics Packaging Technology Conference (EPTC)
·
5
Defect study on Nanoglass® E porous ultra-low k material (k∼2.2) for ultra-large-scale integration applications
2004
·
L. Zhang
, Y.W. Chen
, et al.
·
Materials Science in Semiconductor Processing
·
5
Spatial variation of TSV capacitance and method of stabilization with Al2O3-induced negative fixed charge at the silicon-liner interface
2011
·
L. Zhang
, R. I Made
, et al.
·
Technical digest - International Electron Devices Meeting/Technical digest
·
4
Built-in via module test structure for backend interconnection in-line process monitor
2005
·
H.Y. Li
, W.H. Li
, et al.
·
International Symposium on the Physical and Failure Analysis of Integrated Circuits
·
4
Boosting polysulfides conversion with Fe3O4-loaded carbon derived from willow sawdust for high sulfur loading and lean electrolyte lithium-sulfur batteries
2025
·
Yu Jiang
, Yu Jiang
, et al.
·
Journal of Power Sources
·
3
Surface Electrode Ion Trap Developed and Improvement by Oxide- First- Metal-Last Approach for High Performance Quantum Computing
2020
·
H.Y. Li
, Wen Wei Seit
, et al.
·
IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA)
·
3
Simultaneous formation of electrical connection, mechanical support and hermetic seal with bump-less cu-cu bonding for 3D wafer stacking
2012
·
L. Peng
, J. Fan
, et al.
·
3
Functional Materials and Nanotechnology
2012
·
B. Xu
, H.Y. Li
·
Trans Tech Publications Ltd. eBooks
·
3
Study of barrier layer thickness effect for the micro-bump
2015
·
H.Y. Li
, Norhanani Binte Jaafar
, et al.
·
2
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Works count:
39
Citation count:
439
H-index:
10
I10-index:
11
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