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B.H. Do
Observed names:
B. H. Do,
Benny Do
Observed institution:
Skyworks Solutions (United States)
OpenAlex ID:
A5113915182
InGaAs Negative Capacitance FETs Using HfZrOx: Impact of Annealing Conditions on the Ferroelectric and Steep Subthreshold Slope Characteristics
2018
·
H.Q. Luc
, Y.K. Zhang
, et al.
·
International Conference on Solid State Devices and Materials (SSDM)
Gate-All-Around In0.53Ga0.47As MOSFETs with Ion=3.3mA/µm (Vgs-Vth=Vds=1V) and gm=3.56 mS/µm (Vds=0.5V) using Plasma-Enhanced Atomic Layer Deposition Technique
2018
·
Y.D. Jin
, H.Q. Luc
, et al.
·
International Conference on Solid State Devices and Materials (SSDM)
Enhancing the Performance of Ni-In0.53Ga0.47As MOSFETs Using Post Silicon Dopant Process
2017
·
H. Q. Luc
, W. J. Lin
, et al.
·
International Conference on Solid State Devices and Materials (SSDM)
Integration of Photodefinable Polybenzoxazole as Intermetal Dielectric for GaAs HBT Technology
2014
·
Jiro Yota
, Benny Do
·
ECS Transactions
PDF
Integration of Photodefinable Polybenzoxazole as Intermetal Dielectric for GaAs HBT Technology
2014
·
Jiro Yota
, Benny Do
·
ECS Meeting Abstracts
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