Author

Woo-Sun Lee

Observed names: Lee, Woo-Sun;Ko, Pil-Ju;Kim, Nam-Hoon;Seo, Yong-Jin;, WOO-SUN LEE, Woo Sun Lee, Woosun Lee

Institution: GI Innovation (South Korea)

Observed institutions: Seoul National University, Chosun University, Sungshin Women's University, Purdue University West Lafayette, GI Innovation (South Korea)

OpenAlex ID: A5118626579

ZnO sol–gel derived porous film for CO gas sensing

2003 · Hyun-Wook Ryu, Bo-Seok Park, et al. · Sensors and Actuators B Chemical · 134

Temperature effects of pad conditioning process on oxide CMP: Polishing pad, slurry characteristics, and surface reactions

2005 · Nam-Hoon Kim, Yong-Jin Seo, et al. · Microelectronic Engineering · 56

Influences of thickness-uniformity and surface morphology on the electrical and optical properties of sputtered CdTe thin films for large-area II–VI semiconductor heterostructured solar cells

2010 · Youn-Ok Choi, Nam-Hoon Kim, et al. · Materials Science and Engineering B · 46

An optimization of tungsten plug chemical mechanical polishing (CMP) using different consumables

2001 · Woo-Sun Lee, Sang-Yong Kim, et al. · Journal of Materials Science Materials in Electronics · 46

Structural and surface properties of NiCr thin films prepared by DC magnetron sputtering under variation of annealing conditions

2005 · Yong Kwon, Nam-Hoon Kim, et al. · Microelectronic Engineering · 41

Electrical and optical properties of sputter-deposited cadmium sulfide thin films optimized by annealing temperature

2011 · Nam-Hoon Kim, Seung-Han Ryu, et al. · Materials Science in Semiconductor Processing · 39

Effects of slurry filter size on the chemical mechanical polishing (CMP) defect density

2004 · Yong-Jin Seo, Sang-Yong Kim, et al. · Materials Letters · 38

Chemical mechanical polishing and electrochemical characteristics of tungsten using mixed oxidizers with hydrogen peroxide and ferric nitrate

2005 · Yong-Jin Seo, Nam-Hoon Kim, et al. · Materials Letters · 34

Reduction of process defects using a modified set-up for chemical mechanical polishing equipment

2003 · Yong-Jin Seo, Sang-Yong Kim, et al. · Microelectronic Engineering · 32

A study on the chemical mechanical polishing of oxide film using a zirconia (ZrO2)-mixed abrasive slurry (MAS)

2008 · Sung-Woo Park, Yong-Jin Seo, et al. · Microelectronic Engineering · 30

Effects of different oxidizers on the W-CMP performance

2005 · Yong-Jin Seo, Woo-Sun Lee · Materials Science and Engineering B · 30

Motor-Current-Based Real-Time End Point Detection of Shallow-Trench-Isolation Chemical Mechanical Polishing Process Using High-Selectivity Slurry

2003 · Yong-Jin Seo, Woo-Sun Lee, et al. · Japanese Journal of Applied Physics · 25

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Advantages of point of use (POU) slurry filter and high spray method for reduction of CMP process defects

2003 · Yong-Jin Seo, Sang-Yong Kim, et al. · Microelectronic Engineering · 25

Electrical and Thermal Properties of Platinum Thin Films Prepared by DC Magnetron Sputtering for Micro-Heater of Microsensor Applications after CMP Process

2007 · Nam Hoon Kim, Dong Myong Na, et al. · Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena · 24

Chemical mechanical polishing (CMP) mechanisms of thermal SiO2 film after high-temperature pad conditioning

2005 · Nam-Hoon Kim, Pil-Ju Ko, et al. · Thin Solid Films · 24

Improvements of oxide-chemical mechanical polishing performances and aging effect of alumina and silica mixed abrasive slurries

2004 · Yong-Jin Seo, Woo-Sun Lee, et al. · Microelectronic Engineering · 24

Effects of oxidant additives for exact selectivity control of W- and Ti-CMP process

2004 · Yong-Jin Seo, Woo-Sun Lee · Microelectronic Engineering · 22

Optimization of post-CMP cleaning process for elimination of CMP slurry-induced metallic contaminations

2001 · Yong-Jin Seo, Woo-Sun Lee, et al. · Journal of Materials Science Materials in Electronics · 21

Improvement of TEOS-chemical mechanical polishing performance by control of slurry temperature

2005 · Nam-Hoon Kim, Pil-Ju Ko, et al. · Microelectronic Engineering · 20

Chemical mechanical polishing of Ba0.6Sr0.4TiO3 film prepared by sol–gel method

2004 · Yong-Jin Seo, Woo-Sun Lee · Microelectronic Engineering · 20

CMP characteristics and optical property of ITO thin film by using silica slurry with a variety of process parameters

2006 · Gwon-Woo Choi, Kang-Yeon Lee, et al. · Microelectronic Engineering · 19

Chemical mechanical polishing of PZT thin films for FRAM applications

2006 · Yong-Jin Seo, Jin-Seong Park, et al. · Microelectronic Engineering · 19

Removal characteristics of hillock on SnO2 thin film by chemical mechanical polishing process

2005 · Yong-Jin Seo, Nam-Hoon Kim, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 17

Effects of STI-fill thickness on the CMP process defects

2003 · Yong-Jin Seo, Gi-Uk Kim, et al. · Microelectronic Engineering · 16

Non-selenization method using sputtering deposition with a CuSe2 target for CIGS thin film

2012 · Nam-Hoon Kim, Seongha Oh, et al. · Journal of the Korean Physical Society · 14

Works count: 94

Citation count: 1,063

H-index: 20

I10-index: 31