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Author

In Hyeok Kho

Observed name: Kho, In Hyeok
Observed institution: Kwangwoon University
ORCID: 0009-0006-3029-9885
Observed ORCID: 0009-0006-3029-9885
OpenAlex ID: A5120200781
Cryogenic atomic layer etching of SiO2 using CH2F2/Ar plasma for improved process window for nanoscale fabrication
2025 · Ji Hwan Kim, Jae Hyeon Kim, et al. · Applied Surface Science · 6
Etching suppression of silicon nitride by ammonium fluorosilicate formation during cryogenic NF3/NH3 plasma reactive ion etching
2026 · In Young Bang, Ga Eun Hwang, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 3
NO-driven etching behavior of SiO2 and Si3N4 in cryogenic NF3/NO plasmas
2026 · Yoon Joo Jeong, Hyo Jong Shin, et al. · Journal of Applied Physics · 1
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Capacitive diagnostic sensor embedded in an electrostatic chuck for real-time plasma density measurement
2026 · Chang Hee Lee, Jae Hyeon Kim, et al. · Measurement Science and Technology
PDF
Etching suppression of silicon nitride by ammonium fluorosilicate formation during cryogenic NF3/NH3 plasma reactive ion etching
2026 · Shin, Hyo Jong, Kho, In Hyeok, et al. · AIP Publishing
Supplementary Material
2026 · Bang, In Young, Hwang, Ga Eun, et al. · AIP Publishing
NO-Driven Etching Behavior of SiO2 and Si3N4 in Cryogenic NF3/NO Plasmas
2026 · Kho, In Hyeok, Kwon, Gi-Chung, et al. · AIP Publishing
Supplement Number 1
2026 · Jeong, Yoon Joo, Shin, Hyo Jong, et al. · AIP Publishing
Works count: 8
Citation count: 10
H-index: 2
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