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Jae Hyeon Kim
Observed name:
Kim, Jae Hyeon
Institution:
Kwangwoon University
Observed institution:
Kwangwoon University
ORCID:
0000-0001-5847-9681
Observed ORCID:
0000-0001-5847-9681
OpenAlex ID:
A5133191047
Etching suppression of silicon nitride by ammonium fluorosilicate formation during cryogenic NF3/NH3 plasma reactive ion etching
2026
·
In Young Bang
, Ga Eun Hwang
, et al.
·
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
·
3
NO-driven etching behavior of SiO2 and Si3N4 in cryogenic NF3/NO plasmas
2026
·
Yoon Joo Jeong
, Hyo Jong Shin
, et al.
·
Journal of Applied Physics
·
1
PDF
Capacitive diagnostic sensor embedded in an electrostatic chuck for real-time plasma density measurement
2026
·
Chang Hee Lee
, Jae Hyeon Kim
, et al.
·
Measurement Science and Technology
PDF
NO-Driven Etching Behavior of SiO2 and Si3N4 in Cryogenic NF3/NO Plasmas
2026
·
Kho, In Hyeok
, Kwon, Gi-Chung
, et al.
·
AIP Publishing
Supplement Number 1
2026
·
Jeong, Yoon Joo
, Shin, Hyo Jong
, et al.
·
AIP Publishing
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Works count:
5
Citation count:
4
H-index:
1
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