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Ji Hwan Kim
Observed name:
Kim, Ji Hwan
Institution:
Kwangwoon University
Observed institution:
Kwangwoon University
ORCID:
0009-0005-9360-2290
Observed ORCID:
0009-0005-9360-2290
OpenAlex ID:
A5133233937
Etching suppression of silicon nitride by ammonium fluorosilicate formation during cryogenic NF3/NH3 plasma reactive ion etching
2026
·
In Young Bang
, Ga Eun Hwang
, et al.
·
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
·
3
NO-driven etching behavior of SiO2 and Si3N4 in cryogenic NF3/NO plasmas
2026
·
Yoon Joo Jeong
, Hyo Jong Shin
, et al.
·
Journal of Applied Physics
·
1
PDF
NO-Driven Etching Behavior of SiO2 and Si3N4 in Cryogenic NF3/NO Plasmas
2026
·
Kho, In Hyeok
, Kwon, Gi-Chung
, et al.
·
AIP Publishing
Supplement Number 1
2026
·
Jeong, Yoon Joo
, Shin, Hyo Jong
, et al.
·
AIP Publishing
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Works count:
4
Citation count:
4
H-index:
1
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