Author

Hee Chul Lee

Institution: Tech University of Korea

Observed institution: Tech University of Korea

ORCID: 0000-0002-2280-8647

Observed ORCID: 0000-0002-2280-8647

OpenAlex ID: A5133853029

Plasma-induced optimization of electron trapping for high-k charge trap memories: Mechanistic insights and modeling approaches

2026 · Chan Hee Lee, So Won Kim, et al. · Ceramics International · 1

Inhibitor-free area-selective deposition of HfO2 thin films via plasma-enhanced atomic layer process

2026 · Jun Seo Hwang, Sung Hyun Lim, et al. · Materials Science in Semiconductor Processing

Ultra‐Efficient Memristive Voltage‐Resistance Logic Framework With Integrated Readout Strategy Based on Hafnium Zirconium Oxide

2026 · Wonwoo Kho, Hyunjoo Hwang, et al. · Small Methods

Characteristics and mechanism of NF3 plasma-modulated modification in atomic layer etching of silicon nitride

2026 · Sung Hyun Lim, Jun Seo Hwang, et al. · Materials Science in Semiconductor Processing

Works count: 4

Citation count: 1

H-index: 1

I10-index: