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Taner Ozel
Institution:
Lam Research (United States)
Observed institution:
Lam Research (United States)
ORCID:
0009-0003-3581-9323
Observed ORCID:
0009-0003-3581-9323
OpenAlex ID:
A5143922815
Formation and stability of ammonium fluorosilicate during etching of SiN x in CH2F2/Ar and SF6/H2 plasmas
2025
·
Xue Wang
, Md Tanzid Hossain
, et al.
·
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
·
11
Supplemental figures 1-5
2026
·
Xue Wang
, Md Tanzid Hossain
, et al.
·
AIP Publishing
Detection of silicon-containing etch products during SiN x etching in a hydrogen fluoride plasma using quadrupole mass spectrometry
2026
·
Xue Wang
, Md Tanzid Hossain
, et al.
·
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
Detection of Silicon-Containing Etch Products during SiNx Etching in a Hydrogen Fluoride Plasma Using Quadrupole Mass Spectrometry
2026
·
Harmeet Singh
, Md Tanzid Hossain
, et al.
·
AIP Publishing
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Works count:
4
Citation count:
11
H-index:
1
I10-index:
1
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