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Yuta Ito
Observed name:
Y. Ito
Institutions:
Meiji University,
Meiji (Japan)
Observed institutions:
Meiji University,
Meiji (Japan)
ORCID:
0009-0003-2945-1585
Observed ORCID:
0009-0003-2945-1585
OpenAlex ID:
A5144348673
Evaluation of Interstitial Si Diffusion Induced by Plasma Etching and Annealing Process for Trench Formation
2026
·
R. Fujimori
, Y. Ito
, et al.
·
ECS Journal of Solid State Science and Technology
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