Author

Seokwon Lee

Institution: Korea Advanced Institute of Science and Technology

Observed institution: Korea Advanced Institute of Science and Technology

OpenAlex ID: A5148784169

Oxide Interlayer Engineering in Self-Rectifying Ferroelectric Tunnel Junctions: Oxygen Reservoir Effect on Interface Passivation and Memory Reliability

2026 · Paul Gallegos, Sohyeon An, et al. · ACS Applied Electronic Materials

Works count: 1

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