Source

SPIE Photomask Technology Conference

Source type: conference

Alternate names: Photomask Technology 2023, Photomask Technology 2024, Photomask Technology 2025

Fully OA: No

DOAJ: No

OpenAlex ID: S7407087869

Pellicle films supporting the ramp to HVM with EUV

2017 · Pieter Jan van Zwol, Maxim Nasalevich, et al. · SPIE Photomask Technology Conference · 50

Actinic patterned mask defect inspection for EUV lithography

2019 · Hiroki Miyai, Tsunehito Kohyama, et al. · SPIE Photomask Technology Conference · 29

PDF

Novel EUV mask absorber evaluation in support of next-generation EUV imaging

2018 · Christophe Detavernier, Vicky Philipsen, et al. · SPIE Photomask Technology Conference · 29

PDF

Study of mask and wafer co-design that utilizes a new extreme SIMD approach to computing in memory manufacturing: full-chip curvilinear ILT in a day

2019 · Linyong Pang, Ezequiel V. Russell, et al. · SPIE Photomask Technology Conference · 26

Curvilinear masks: an overview

2021 · Yohan Choi, Aki Fujimura, et al. · SPIE Photomask Technology Conference · 23

Machine learning for mask/wafer hotspot detection and mask synthesis

2017 · David Z. Pan, Yibo Lin, et al. · SPIE Photomask Technology Conference · 23

Manufacturing challenges for curvilinear masks

2017 · Shuichiro Ohara, Christopher A. Spence, et al. · SPIE Photomask Technology Conference · 21

Lithographic benefits and mask manufacturability study of curvilinear masks

2018 · Alexander Wei, Wei Guo, et al. · SPIE Photomask Technology Conference · 20

CNT EUV pellicle: moving towards a full-size solution

2017 · Johan Meersschaut, Olivier Richard, et al. · SPIE Photomask Technology Conference · 20

PDF

MRC for curvilinear mask shapes

2020 · Ingo Bork, Alexander Tritchkov, et al. · SPIE Photomask Technology Conference · 19

Machine learning assisted SRAF placement for full chip

2017 · Jing Su, Quan Zhang, et al. · SPIE Photomask Technology Conference · 17

Adopting curvilinear shapes for production ILT: challenges and opportunities

2019 · Ryan Pearman, P. Jeffrey Ungar, et al. · SPIE Photomask Technology Conference · 16

Open-source software for SEM metrology

2020 · Iacopo Mochi, Michaela Vockenhuber, et al. · SPIE Photomask Technology Conference · 15

PDF

Depth of focus in high-NA EUV lithography: a simulation study

2022 · Anatoly Burov, Alessandro Vaglio Pret, et al. · SPIE Photomask Technology Conference · 14

Towards improving challenging stochastic defect detection in SEM images based on improved YOLOv5

2022 · Bappaditya Dey, Enrique Dehaerne, et al. · SPIE Photomask Technology Conference · 14

Contacts and lines SEM image metrology with SMILE

2021 · Iacopo Mochi, Michaela Vockenhuber, et al. · SPIE Photomask Technology Conference · 13

PDF

Mask process correction validation for multi-beam mask lithography

2018 · Ingo Bork, Peter Buck, et al. · SPIE Photomask Technology Conference · 13

Rapid full-chip curvilinear OPC for advanced logic and memory

2021 · Vlad Liubich, Keisuke Mizuuchi, et al. · SPIE Photomask Technology Conference · 11

Requirements of data technology for EUV photomask

2019 · Jin Choi, Jonggul Doh, et al. · SPIE Photomask Technology Conference · 11

Automated rough line-edge estimation from SEM images using deep convolutional neural networks

2018 · Narendra Chaudhary, Serap A. Savari, et al. · SPIE Photomask Technology Conference · 11

CLMPC: curvilinear MPC in a mask data preparation flow

2017 · Malavika Sharma, Ingo Bork, et al. · SPIE Photomask Technology Conference · 11

Enabling faster VSB writing of 193i curvilinear ILT masks that improve wafer process windows for advanced memory applications

2020 · Linyong (Leo) Pang, Ezequiel V. Russell, et al. · SPIE Photomask Technology Conference · 10

Logic and memory patterning breakthrough using High-NA lithography

2024 · Victor M. Blanco Carballo, Syamashree Roy, et al. · SPIE Photomask Technology Conference · 9

Curvature based fragmentation for curvilinear mask process correction

2021 · Ingo Bork, Peter Buck, et al. · SPIE Photomask Technology Conference · 9

High resolution and uniform image reconstruction in a large field-of-view for EUV actinic mask review

2020 · Hyun-Su Kim, Uldis Locans, et al. · SPIE Photomask Technology Conference · 9

PDF

Works count: 513

Citation count: 1,052

H-index: 14

I10-index: 22

2yr mean citedness: 0.516