Work

Emerging Nanoscale Interconnect Processing Technologies: Fundamental and Practice

Year: 2009

Type: book-chapter

Source: Springer eBooks

DOI: 10.1007/978-0-387-95868-2_34

Authors: Alain E. Kaloyeros, James Castracane, Kathleen Dunn, Eric Eisenbraun, Anand Gadre, Vincent LaBella, Timothy Stoner, Bai Xu, James G. Ryan, Anna Topol

Institutions: University at Albany, State University of New York, IBM Research - Thomas J. Watson Research Center

Language: English

Topic: Copper Interconnects and Reliability

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1509790939

FWCI:

Cites: 80

Cited by:

Related to: 10