Work

Shadow Mask Evaporation and its Application in Nano-Electronics

Year: 2002

Type: article

Source: APS

Authors: Yangxin Zhou, James Hone, A. T. Charlie Johnson, W. F. Smith, Nick Pinto

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W154618225

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