Mechanistic studies of the CVD of silicon nitride from SiF{sub 4} and NH{sub 3}
Year: 1992
Type: article
Abstract: An industrial process for the CVD of silicon nitride from SiF[sub 4] and NH[sub 3] was studied with a wide variety of techniques, ranging from numerical models of the coupled chemistry and fluid mechanics to experimental studies of chemical reactions. The latter includes a set of molecular beam experiments that probed the temperature and flux dependencies of the reaction of SiF[sub 4] and NH[sub 3] at the surface. These experiments showed that the CVD reactor chemistry was dominated by surface kinetics rather than gas-phase decomposition.
Authors: Richard J. Buss, P Shing Ho
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: green
OpenAlex ID: W1560873630