Thermal stability of ultrathin ZrO2 films prepared by chemical vapor deposition on Si(100)
Year: 2001
Type: article
Source: Applied Physics Letters
DOI: 10.1063/1.1339994
Authors: T. S. Jeon, J. M. White, D. L. Kwong
Institutions: Texas Materials Institute, The University of Texas at Austin
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W1572253984