Work

A Point Defect Model for Anodic Passive Films: II . Chemical Breakdown and Pit Initiation

Year: 1981
Type: article
Abstract: The point defect model that was previously developed (1) to explain the growth kinetics of a passive film has been extended to account for chemical breakdown. This model provides quantitative explanations of the dependence of breakdown potential on halide concentration, and of the incubation time‐breakdown overpotential relationships that have been observed for iron and nickel in aqueous solutions. Limitations of the model are identified and discussed.
Language: English
Open Access status: bronze
OpenAlex ID: W1596628295
FWCI: 5.137
Cites:
Cited by: 681
Related to: 10