Work

Step-and-Repeat X-ray/Photo Hybrid Lithography for 0.3 μm Mos Devices

Year: 1985

Type: conference-paper

Source: Symposium on VLSI Technology

Authors: K. Deguchi, Kazuma Komatsu, H. Namatsu, Misao Sekimoto, Masayuki Miyake, Keiji Hirata

Institution: NTT (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1599891132

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