Work

Low temperature development of PMMA for sub-10-nm electron beam lithography

Year: 2004

Type: conference-paper

Source: IEEE Conference on Nanotechnology (IEEE NANO)

DOI: 10.1109/nano.2003.1230983

Authors: Wenchuang Hu, G.H. Bernstein, K. Sarveswaran, M. Lieberman

Institution: University of Notre Dame

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1602554036

FWCI: 1.629

Cites: 23

Cited by: 11

Related to: 10