Work

Pattern interpolation in thin films of lamellar, symmetric copolymers on nano-patterned substrates

Year: 2009

Type: article

Source: Bulletin of the American Physical Society

Authors: François Detcheverry, Umang Nagpal, Guoliang Liu, Paul F. Nealey, Juan Pablo

Language: English

Topic: Block Copolymer Self-Assembly

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1646745744

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