Work

High Precision X-Ray Lithographic Masks

Year: 1992

Type: article

Source: Defense Technical Information Center (DTIC)

Authors: R. F. W. Pease, R. Browning

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1650883273

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