Work

MEMS-based gray-scale lithography

Year: 2002

Type: conference-paper

DOI: 10.1109/isdrs.2001.984470

Authors: C.M. Waits, R. Ghodssi, M.H. Ervin, M. Dubey

Institutions: DEVCOM Army Research Laboratory, University of Maryland, College Park

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1860404560

FWCI: 0.712

Cites: 5

Cited by: 14

Related to: 10