A high-speed P-channel random access 1024-bit memory made with electron lithography
Year: 1975
Type: article
Authors: R.C. Henderson, R.F. Pease, A.M. Voshchenkov, R.F. Helm, R.L. Wadsack
Institution: AT&T (United States)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W1964113047
