Work

Design of multilayer antireflection coatings made from co-sputtered and low-refractive-index materials by genetic algorithm

Year: 2008

Type: article

Abstract: Designs of multilayer antireflection coatings made from co-sputtered and low-refractive-index materials are optimized using a genetic algorithm. Co-sputtered and low-refractive-index materials allow the fine-tuning of refractive index, which is required to achieve optimum anti-reflection characteristics. The algorithm minimizes reflection over a wide range of wavelengths and incident angles, and includes material dispersion. Designs of antireflection coatings for silicon-based image sensors and solar cells, as well as triple-junction GaInP/GaAs/Ge solar cells are presented, and are shown to have significant performance advantages over conventional coatings. Nano-porous low-refractive-index layers are found to comprise generally half of the layers in an optimized antireflection coating, which underscores the importance of nano-porous layers for high-performance broadband and omnidirectional antireflection coatings.

Source: Optics Express

DOI: 10.1364/oe.16.005290

Authors: Martin F. Schubert, Frank W. Mont, Sameer Chhajed, David J. Poxson, Jong Kyu Kim, E. Fred Schubert

Institution: Rensselaer Polytechnic Institute

Language: English

Topic: Optical Coatings and Gratings

Subfield: Surfaces, Coatings and Films

Field: Materials Science

Domain: Physical Sciences

Open Access status: gold

Estimated APC paid: $2,270

Funders: National Science Foundation, Samsung