Work

Modeling rapid thermal annealing processes for shallow junction formation in silicon

Year: 1983

Type: conference-paper

Source: Technical digest - International Electron Devices Meeting/Technical digest

DOI: 10.1109/iedm.1983.190593

Authors: R.B. Fair, J.J. Wo, J. Liu

Institutions: MCNC Research and Development Institute, North Carolina State University

Language: English

Topic: Semiconductor materials and interfaces

Subfield: Atomic and Molecular Physics, and Optics

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1965228217

FWCI: 10.3

Cites: 1

Cited by: 5

Related to: 10