Work

The Effects of Chemical Oxide on the Deposition of Tungsten by the Silicon Reduction of Tungsten Hexafluoride

Year: 1987

Type: article

Source: Journal of The Electrochemical Society

DOI: 10.1149/1.2100882

Authors: M. Wong, N. Kobayashi, R. Browning, D. Paine, K. C. Saraswat

Institutions: Stanford SystemX Alliance, Stanford University

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1967348382

FWCI: 5.659

Cites:

Cited by: 27

Related to: 10