Work

Gate-induced insulating state in bilayer graphene devices

Year: 2007

Type: article

Source: Nature Materials

DOI: 10.1038/nmat2082

Authors: Jeroen B. Oostinga, Hubert B. Heersche, Xinglan Liu, Alberto F. Morpurgo, Lieven M. K. Vandersypen

Institution: Delft University of Technology

Language: English

Topic: Graphene research and applications

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: green

OpenAlex ID: W1967986301

FWCI: 51.74

Cites: 26

Cited by: 1,669

Related to: 10