Work

A resist for electric imprint lithography

Year: 2008

Type: article

Source: Microelectronic Engineering

DOI: 10.1016/j.mee.2008.11.085

Authors: Yong Sik Ahn, Yong Chen, H. Thomas Hahn

Institution: University of California, Los Angeles

Language: English

Topic: Nanofabrication and Lithography Techniques

Subfield: Biomedical Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1968363863

FWCI: 0.213

Cites: 13

Cited by: 2

Related to: 10