Year: 1987
Type: article
Abstract: A lift-off technique is applied to the fabrication of all-refractory Nb/Al-oxide/Nb Josephson tunneling junctions. It is found that the lift-off is very efficient for lowering the influence of stresses in refractory metal electrode on junction characteristics. Small junctions (1 µm) with low leakage current can be fabricated by lift-off technique, whereas an etching process increases leakage currents of small junctions. Current-voltage characteristics of Vm=25 mV at a current density of 10 kA/cm2 and a junction current standard deviation of 3.2% in 1 µm size junctions are obtained.
DOI: 10.1143/jjap.26.l166
Authors: Masahiro Yuda, Ken'ichi Kuroda, Jun'ichi Nakano
Institution: NTT (Japan)
Language: English
Subfield: Astronomy and Astrophysics
Field: Physics and Astronomy
Domain: Physical Sciences
Open Access status: bronze
OpenAlex ID: W1969278142
