Electrical characteristics of thin Ta2O5 films deposited by reactive pulsed direct-current magnetron sputtering
Year: 2000
Type: article
Source: Journal of Applied Physics
DOI: 10.1063/1.372033
Institution: Rensselaer Polytechnic Institute
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W1969595558