Work

Remediation of Line Edge Roughness in Chemical Nanopatterns by the Directed Assembly of Overlying Block Copolymer Films

Year: 2010

Type: article

Source: Macromolecules

DOI: 10.1021/ma902494v

Authors: Mark P. Stoykovich, Kostas Ch. Daoulas, Marcus Müller, Huiman Kang, Juan J. de Pablo, Paul F. Nealey

Institutions: University of Colorado Boulder, University of Wisconsin–Madison, University of Göttingen

Language: English

Topic: Block Copolymer Self-Assembly

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1970102341

FWCI: 5.178

Cites: 46

Cited by: 94

Related to: 10