Work

Morphological Development in Solvent-Cast Polystyrene−Polybutadiene−Polystyrene (SBS) Triblock Copolymer Thin Films

Year: 1998

Type: article

Source: Macromolecules

DOI: 10.1021/ma971349i

Authors: G. Kim, M. Libera

Institution: Stevens Institute of Technology

Language: English

Topic: Block Copolymer Self-Assembly

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1971227934

FWCI: 6.173

Cites: 33

Cited by: 464

Related to: 10