Work

Structure and Tribology Property of Carbon Nitride Films Deposited by MW-ECR Plasma Enhanced Unbalanced Magnetron Sputtering

Year: 2006

Type: article

Abstract: Carbon nitride films were deposited by a twinned microwave electron cyclotron resonance (ECR) plasma source enhanced unbalanced magnetron sputtering system. The results indicate that the structure of the films is sensitive to the nitrogen content. The increase in the nitrogen flow ratio leads to an increase in the sp 3 content and an improvement of the tribological properties.

Source: Plasma Science and Technology

DOI: 10.1088/1009-0630/8/4/12

Authors: Gao Peng, Xu Jun, Piao Yong, Ding Wanyu, Deng Xinlu, Dong Chuang

Institutions: Dalian University of Technology, Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Chinese Academy of Sciences, International Centre for Materials Physics

Language: English

Topic: Metal and Thin Film Mechanics

Subfield: Mechanics of Materials

Field: Engineering

Domain: Physical Sciences

Open Access status: bronze

Funder: National Natural Science Foundation of China

OpenAlex ID: W1971453570

FWCI: 1.159

Cites: 15

Cited by: 7

Related to: 10