Work

Process optimization of 200 nm wide trenches in SiO2 using a chemically amplified acid catalyzed e-beam resist

Year: 1992

Type: article

Source: Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

DOI: 10.1116/1.586325

Authors: Waldemar W. Kocon, Y. Shacham-Diamand, Jean M. J. Frechet, James Fahey

Institution: Cornell University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1972660581

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