Work

Design, Synthesis, and Characterization of Carbon-Rich Cyclopolymers for 193 nm Microlithography

Year: 2001

Type: article

Source: Chemistry of Materials

DOI: 10.1021/cm0104304

Authors: Dario Pasini, John M. Klopp, Jean M. J. Fréchet

Institutions: Lawrence Berkeley National Laboratory, University of California, Berkeley

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: U.S. Department of Energy

OpenAlex ID: W1973265319

FWCI: 2.092

Cites: 39

Cited by: 43

Related to: 10