Work

Oxidation, Impurity Diffusion, and Defect Growth in Silicon—An Overview

Year: 1981

Type: article

Source: Journal of The Electrochemical Society

DOI: 10.1149/1.2127636

Author: R. B. Fair

Institution: AT&T (United States)

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1973703918

FWCI: 10.66

Cites:

Cited by: 82

Related to: 10