Work

Chlorination of hydrogen-terminated silicon (111) surfaces

Year: 2005

Type: article

Source: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

DOI: 10.1116/1.1861941

Authors: Sandrine Rivillon, Yves J. Chabal, Lauren J. Webb, David J. Michalak, Nathan S. Lewis, Mathew D. Halls, Krishnan Raghavachari

Institutions: Rutgers, The State University of New Jersey, California Institute of Technology, Indiana University Bloomington, Indiana University

Language: English

Topic: Semiconductor materials and interfaces

Subfield: Atomic and Molecular Physics, and Optics

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: closed

Funders: National Science Foundation, U.S. Department of Energy, Division of Chemistry, Brookhaven National Laboratory

Awards: G132563423, G1336448005, G1572106353, G338944111, Surface Chemical Functionalization of Technologically Important Semiconductors: Silicon, Germanium, and Silicon Carbide, G5292656900, Achieving Molecular Level Control over the Chemical, Electrochemical, and Electrical Properties of Crystalline Si Surfaces, G969889393

OpenAlex ID: W1973752745

FWCI: 3.481

Cites: 46

Cited by: 77

Related to: 10