Year: 2013
Type: article
Abstract: With the demand for improved performance in microfabricated devices, the necessity to apply greater electric fields and voltages becomes evident. When operating in vacuum, the voltage is typically limited by surface flashover forming along the surface of a dielectric. By modifying the fabrication process, we have discovered it is possible to more than double the flashover voltage. Our finding has significant impact on the realization of next-generation micro- and nano-fabricated devices and for the fabrication of on-chip ion trap arrays for the realization of scalable ion quantum technology.
Source: Applied Physics Letters
DOI: 10.1063/1.4824012
Authors: R. C. Sterling, M. D. Hughes, C. J. Mellor, W. K. Hensinger
Institutions: University of Sussex, University of Nottingham
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: bronze
OpenAlex ID: W1974078656
