Work

Stress evaluation of chemical vapor deposited silicon dioxide films

Year: 2002

Type: article

Source: Physica B Condensed Matter

DOI: 10.1016/s0921-4526(02)01291-7

Authors: Masahiko Maeda, Manabu Itsumi

Institutions: Kanazawa Institute of Technology, NTT (Japan)

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1974329345

FWCI: 0.338

Cites: 13

Cited by: 4

Related to: 10