Work

Growth and characterization of boron carbon nitride films with low dielectric constant

Year: 2003

Type: article

Source: Diamond and Related Materials

DOI: 10.1016/s0925-9635(02)00344-8

Authors: Tomoyoshi Tai, Tomohiko Sugiyama, Takashi Sugino

Institution: The University of Osaka

Language: English

Topic: Copper Interconnects and Reliability

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1974683791

FWCI: 1.219

Cites: 25

Cited by: 25

Related to: 10