Electrodeposition of Bi2Te3 Films from Ammoniacal Basic Solutions Containing Nitrilotriacetic Acid
Year: 2004
Type: article
Abstract: Bi2Te3 thin films were electrochemically deposited from ammonia-alkaline solution containing Bi(NO3)3, TeO2, nitrilotriacetic acid (NTA), in which Bi(III)- and Te(IV)-species were dissolving to form Bi(NTA)23- complex and TeO32-, respectively. This study revealed the relationship between [Bi]/[Te] ratio in the solution and the respective metal ratio in the deposited film. The [Bi]/[Te] ratio of the deposited film was successfully controlled by conducting electrodeposition under diffusion-limited conditions, i.e. the [Bi]/[Te] ratio in the solution was linearly related to that of the deposited film, where the partial current density originating from bismuth and tellurium ion was directly proportional to the concentration of respective ions. Dense and crystalline Bi2Te3 thin films with stoichiometric composition were electrodeposited at the potential ranging from −0.6 to −0.8 V from 5.0×10-3 kmol m-3 Bi(NO3)3 · 5H2O, 3.0×10-3 kmol m-3 TeO2 and 0.1 kmol m-3 NTA solution, with cathodic current efficiencies being above 85%.
Authors: Yasuhiro Ishimori, Takahiro Ishizaki, Takeshi Ohtomo, Akio Fuwa
Institution: Waseda University
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: bronze
OpenAlex ID: W1975088397