Work

Designing photoresist systems for CO 2 -based microlithography

Year: 2002

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.474240

Authors: Devin Flowers, Erik N. Hoggan, Ruben G. Carbonell, Joseph M. DeSimone

Institutions: University of North Carolina at Chapel Hill, North Carolina State University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDGs: Responsible consumption and production, Climate action

Open Access status: closed

Funders: National Science Foundation, Georgia Institute of Technology

OpenAlex ID: W1975310195

FWCI: 0.711

Cites:

Cited by: 5

Related to: 10