Work

Progress towards the development of a 157-nm photoresist for carbon- dioxide-based lithography

Year: 2003

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.483718

Authors: Luke A. Zannoni, Jay Simhan, Joseph M. DeSimone

Institutions: University of North Carolina at Chapel Hill, North Carolina State University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Climate action

Open Access status: closed

Funder: National Science Foundation

OpenAlex ID: W1975937882

FWCI: 0.865

Cites:

Cited by: 2

Related to: 10