Work

Using high-contrast salty development of hydrogen silsesquioxane for sub-10-nm half-pitch lithography

Year: 2007

Type: article

Source: Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

DOI: 10.1116/1.2801881

Authors: Joel K. W. Yang, Karl K. Berggren

Institution: Massachusetts Institute of Technology

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Air Force Office of Scientific Research

OpenAlex ID: W1976358567

FWCI: 11

Cites: 14

Cited by: 204

Related to: 10