Work

Atomic layer deposition of tungsten using sequential surface chemistry with a sacrificial stripping reaction

Year: 2000

Type: article

Source: Thin Solid Films

DOI: 10.1016/s0040-6090(99)01076-7

Authors: J.W Klaus, S.J Ferro, S.M George

Institution: University of Colorado Boulder

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1976606328

FWCI: 9.996

Cites: 40

Cited by: 195

Related to: 9