Work

An Ultraviolet-Curable Mold for Sub-100-nm Lithography

Year: 2004

Type: article

Source: Journal of the American Chemical Society

DOI: 10.1021/ja048972k

Authors: Se-Jin Choi, Pil J. Yoo, Seung J. Baek, Tae W. Kim, Hong H. Lee

Institution: Seoul National University

Language: English

Topic: Nanofabrication and Lithography Techniques

Subfield: Surfaces, Coatings and Films

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1976988389

FWCI: 12.4

Cites: 10

Cited by: 293

Related to: 10

Parts: 1