Work

Damage removal/dopant diffusion tradeoffs in ultra-shallow implanted p/sup +/-n junctions

Year: 1990

Type: article

Source: IEEE Transactions on Electron Devices

DOI: 10.1109/16.59914

Author: R.B. Fair

Institutions: Duke University, MCNC Research and Development Institute

Language: English

Topic: Semiconductor materials and interfaces

Subfield: Atomic and Molecular Physics, and Optics

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1977494638

FWCI: 1.546

Cites: 27

Cited by: 30

Related to: 10