Work

Alicyclic photoresists for CO 2 -based microlithography at 157 nm

Year: 2003

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.485093

Authors: Mary Kate Boggiano, Joseph M. DeSimone

Institutions: University of North Carolina at Chapel Hill, North Carolina State University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: National Science Foundation, East Carolina University

OpenAlex ID: W1978412216

FWCI: 0.432

Cites:

Cited by: 1

Related to: 10