Work

Final CD control through slope/sidewall angle correlation with stepper defocus and electrical parametric

Year: 2001

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.425243

Authors: Robert L. Campbell, Bo Su, Terry L. Seregely, Steve Wallace, Frances H. Schantz

Institutions: Dominion (United States), Applied Materials (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1980026281

FWCI:

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